Asrock x99 extreme4 drivers
X99 Extreme4/3.1.ASRock > X99 Extreme4
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Asrock x99 extreme4 drivers.ASrock x99 extreme4 drivers download? | Tom’s Hardware Forum
Latest Drivers Update; Latest Utilities Update; Please key in the name of your product to search. Fatal1ty X99X Killer/ X99 Extreme X99 Extreme3. X99 Extreme4. X99 Extreme4/ X99 Extreme6. X99 Extreme6/ X99 Extreme6/ac. X99 OC Formula. X99 OC Formula/ X99 Taichi. X99 WS. X99 WS-E. X99 WS-E/10G Information published on. X99M Extreme4. ASRock Super Alloy – XXL Aluminum Alloy Heatsink – Premium 60A Power Choke – Intel ® X Memory – Quad Channel DDR4 Memory Technology – 4 x DDR4 DIMM Slots – Supports DDR4 + – ASRock Easy Driver Installer. Support CD – Drivers, Utilities, AntiVirus Software (Trial Version), Google Chrome Browser and Toolbar, Start8. Description:Intel USB driver for ASRock X99 Extreme4. Intel USB driver ver Windows 7 ver Windows 7 64bit ver Download ASRock X99 Extreme4 Intel USB driver v Found – 16 files at 4 pages for ASRock X99 Extreme4. 1.
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Nikon launches 1.07 aperture lithographic scanner
Nikon announces the release of the first immersion instrument with a numerical aperture (NA) over one. Utilizing a 193nm light source, the NSR-S609B provides a NA value of 1.07 and is capable of processing at least 130 300mm wafers per hour. Nikon Positions New Scanner for 55nm Chip Manufacturing and 45nm Testing.
Thus, with the release of the S609B, Nikon, hinting at an imminent release of this device at the SPIE Microlithography Conference, has a chance to slightly outflank its competitors ASML and Canon in the immersion lithography equipment market.
In response, ASML is going to introduce the 1700i scanner, which also provides an aperture of more than one, but, like Canon, it will not have time to start shipping before the end of this year.
Nikon, in turn, emphasizes that it was the first to begin shipping 0.85 NA systems for 90nm production. In addition to the high aperture, the S609B is also interesting in that it uses the “local fill” technology (local fill – with water, I suppose) and a two-stage design, which allows to achieve a high processing speed of substrates. The first stage is the exposure of the plates, the second is the calibration. The error when applying lithographic drawings does not exceed 7 nm.
With regard to “local filling”, this technology, in addition to a processing speed of 500 mm / s, avoids contamination of the back surface of the plate and the appearance of other unpleasant effects, for example, micro bubbles. Finally, another highlight of the new scanner is the Polano illumination system, which uses polarized light. Polano claims to have 20% higher image contrast than unpolarized light systems.
S609B deliveries are expected to begin in the second half of this year.